In this paper we describe our investigations on surface tension charac
terisation of the Plasmask(R) resist during the HMDS silylation proces
s. Emphasis is put on the decrease of the polar component during the p
rocess. Whereas non modified novolacs are not soluble in non polar sol
vent like xylene, toluene or chlorobenzene, these solvents are found t
o dissolve the upper part of the exposed areas.