Authors: DEBUSSCHERE I DEFERM L VANDERVORST W

Citation: I. Debusschere et al., IMPORTANCE OF DETERMINING THE POLYSILICON DOPANT PROFILE DURING PROCESS-DEVELOPMENT, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(1), 1996, pp. 265-271

Authors: HEIJNE EHM ANTINORI F BEKER H BATIGNANI G BEUSCH W BONVICINI V BOSISIO L BOUTONNET C BURGER P CAMPBELL M CANTONI P CATANESI MG CHESI E CLAEYS C CLEMENS JC SOLAL MC DARBO G DAVIA C DEBUSSCHERE I DELPIERRE P DIBARI D DILIBERTO S DIERICKX B ENZ CC FOCARDI E FORTI F GALLY Y GLASER M GYS T HABRARD MC HALLEWELL G HERMANS L HEUSER J HURST R INZANI P JAEGER JJ JARRON P KARTTAAVI T KERSTEN S KRUMMENACHER F LEITNER R LEMEILLEUR F LENTI V LETHEREN M LOKAJICEK M LOUKAS D MACDERMOTT M MAGGI G MANZARI V MARTINENGO P MEDDELER G MEDDI F MEKKAOUI A MENTREY A MIDDELKAMP P MORANDO M MUNNS A MUSICO P NAVA P NAVACH F NEYER C PELLEGRINI F PENGG F PEREGO R PINDO M POSPISIL S POTHEAU R QUERCIGH E REDAELLI N RIDKY J ROSSI L SAUVAGE D SEGATO G SIMONE S SOPKO B STEFANINI G STRAKOS V TEMPESTA P TONELLI G VEGNI G VERWEIJ H VIERTEL GM VRBA V WAISBARD J

Citation: Ehm. Heijne et al., DEVELOPMENT OF SILICON MICROPATTERN PIXEL DETECTORS, Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 348(2-3), 1994, pp. 399-408

Authors: DIERICKX B WOUTERS D WILLEMS G ALAERTS A DEBUSSCHERE I SIMOEN E VLUMMENS J AKIMOTO H CLAEYS C MAES H HERMANS L HEIJNE EHM JARRON P ANGHINOLFI F CAMPBELL M PENGG FX ASPELL P BOSISIO L FOCARDI E FORTI F KASHIGIN S MEKKAOUI A HABRARD MC SAUVAGE D DELPIERRE P

Citation: B. Dierickx et al., INTEGRATION OF CMOS-ELECTRONICS AND PARTICLE DETECTOR DIODES IN HIGH-RESISTIVITY SILICON-ON-INSULATOR WAFERS, IEEE transactions on nuclear science, 40(4), 1993, pp. 753-758