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Results: 1-12 |
Results: 12
A SURFACE AND A GAS-PHASE MECHANISM FOR THE DESCRIPTION OF GROWTH ON THE DIAMOND(100) SURFACE IN AN OXY-ACETYLENE TORCH REACTOR
Authors: OKKERSE M DECROON MHJM KLEIJN CR VANDENAKKER HEA MARIN GB
Citation: M. Okkerse et al., A SURFACE AND A GAS-PHASE MECHANISM FOR THE DESCRIPTION OF GROWTH ON THE DIAMOND(100) SURFACE IN AN OXY-ACETYLENE TORCH REACTOR, Journal of applied physics, 84(11), 1998, pp. 6387-6398
THE KINETICS OF THE LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF POLYCRYSTALLINE SILICON FROM SILANE
Authors: WEERTS WLM DECROON MHJM MARIN GB
Citation: Wlm. Weerts et al., THE KINETICS OF THE LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF POLYCRYSTALLINE SILICON FROM SILANE, Journal of the Electrochemical Society, 145(4), 1998, pp. 1318-1330
STRUCTURAL STABILITY OF KINETIC-MODELS - ANOMALIES DUE TO IRREVERSIBLE ADSORPTION
Authors: NIBBELKE RH HOEBINK JHBJ DECROON MHJM MARIN GB
Citation: Rh. Nibbelke et al., STRUCTURAL STABILITY OF KINETIC-MODELS - ANOMALIES DUE TO IRREVERSIBLE ADSORPTION, AIChE journal, 44(4), 1998, pp. 937-942
LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF POLYCRYSTALLINE SILICON - ANALYSIS OF NONUNIFORM GROWTH IN AN INDUSTRIAL-SCALE REACTOR
Authors: WEERTS WLM DECROON MHJM MARIN GB
Citation: Wlm. Weerts et al., LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF POLYCRYSTALLINE SILICON - ANALYSIS OF NONUNIFORM GROWTH IN AN INDUSTRIAL-SCALE REACTOR, Journal of the Electrochemical Society, 144(9), 1997, pp. 3213-3221
THE ADSORPTION OF SILANE, DISILANE AND TRISILANE ON POLYCRYSTALLINE SILICON - A TRANSIENT KINETIC-STUDY
Authors: WEERTS WLM DECROON MHJM MARIN GB
Citation: Wlm. Weerts et al., THE ADSORPTION OF SILANE, DISILANE AND TRISILANE ON POLYCRYSTALLINE SILICON - A TRANSIENT KINETIC-STUDY, Surface science, 367(3), 1996, pp. 321-339
A LABORATORY REACTOR FOR KINETIC-STUDIES OF GAS-SOLID REACTIONS AT LOW-PRESSURES - DESIGN AND MODELING IN THE PRESENCE OF IRREDUCIBLE TRANSPORT PHENOMENA
Authors: WEERTS WLM DECROON MHJM MARIN GB
Citation: Wlm. Weerts et al., A LABORATORY REACTOR FOR KINETIC-STUDIES OF GAS-SOLID REACTIONS AT LOW-PRESSURES - DESIGN AND MODELING IN THE PRESENCE OF IRREDUCIBLE TRANSPORT PHENOMENA, Chemical Engineering Science, 51(11), 1996, pp. 2583-2588
LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF POLYCRYSTALLINE SILICON - VALIDATION AND ASSESSMENT OF REACTOR MODELS
Authors: WEERTS WLM DECROON MHJM MARIN GB
Citation: Wlm. Weerts et al., LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION OF POLYCRYSTALLINE SILICON - VALIDATION AND ASSESSMENT OF REACTOR MODELS, Chemical Engineering Science, 51(10), 1996, pp. 2109-2118
MODELING OF THE DEPOSITION OF MOLYBDENUM ON SILICON FROM MOLYBDENUM HEXAFLUORIDE AND HYDROGEN
Authors: ORIJ EN DECROON MHJM MARIN GB
Citation: En. Orij et al., MODELING OF THE DEPOSITION OF MOLYBDENUM ON SILICON FROM MOLYBDENUM HEXAFLUORIDE AND HYDROGEN, Journal de physique. IV, 5(C5), 1995, pp. 331-338
MODELING OF THE DEPOSITION OF MOLYBDENUM ON SILICON FROM MOLYBDENUM HEXAFLUORIDE AND HYDROGEN
Authors: ORIJ EN DECROON MHJM MARIN GB
Citation: En. Orij et al., MODELING OF THE DEPOSITION OF MOLYBDENUM ON SILICON FROM MOLYBDENUM HEXAFLUORIDE AND HYDROGEN, Journal de physique. IV, 5(C5), 1995, pp. 331-338
ANALYSIS OF THE ISOTHERMAL FORCED FLOW CHEMICAL-VAPOR INFILTRATION PROCESS .1. THEORETICAL ASPECTS
Authors: ROMAN YG KOTTE JFAK DECROON MHJM
Citation: Yg. Roman et al., ANALYSIS OF THE ISOTHERMAL FORCED FLOW CHEMICAL-VAPOR INFILTRATION PROCESS .1. THEORETICAL ASPECTS, Journal of the European Ceramic Society, 15(9), 1995, pp. 875-886
ANALYSIS OF THE ISOTHERMAL FORCED FLOW CHEMICAL-VAPOR INFILTRATION PROCESS .2. EXPERIMENTAL-STUDY
Authors: ROMAN YG DECROON MHJM METSELAAR R
Citation: Yg. Roman et al., ANALYSIS OF THE ISOTHERMAL FORCED FLOW CHEMICAL-VAPOR INFILTRATION PROCESS .2. EXPERIMENTAL-STUDY, Journal of the European Ceramic Society, 15(9), 1995, pp. 887-898
THE OXIDATIVE COUPLING OF METHANE OVER MGO-BASED CATALYSTS - A STEADY-STATE ISOTOPE TRANSIENT KINETIC-ANALYSIS
Authors: NIBBELKE RH SCHEEROVA J DECROON MHJM MARIN GB
Citation: Rh. Nibbelke et al., THE OXIDATIVE COUPLING OF METHANE OVER MGO-BASED CATALYSTS - A STEADY-STATE ISOTOPE TRANSIENT KINETIC-ANALYSIS, Journal of catalysis, 156(1), 1995, pp. 106-119
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