Authors:
INDERMUHLE PF
ROTH S
DELLMANN L
DEROOIJ NF
Citation: Pf. Indermuhle et al., PATTERNED THICK PHOTORESIST LAYERS FOR PROTECTION OF PROTRUDING STRUCTURES DURING WET AND DRY-ETCHING PROCESSES, Journal of micromechanics and microengineering, 8(2), 1998, pp. 74-76
Authors:
DELLMANN L
ROTH S
BEURET C
PARATTE L
RACINE GA
LORENZ H
DESPONT M
RENAUD P
VETTIGER P
DEROOIJ NF
Citation: L. Dellmann et al., 2 STEPS MICROMOULDING AND PHOTOPOLYMER HIGH-ASPECT-RATIO STRUCTURING FOR APPLICATIONS IN PIEZOELECTRIC MOTOR COMPONENTS, Microsystem technologies, 4(3), 1998, pp. 147-150
Authors:
DELLMANN L
ROTH S
BEURET C
RACINE GA
LORENZ H
DESPONT M
RENAUD P
VETTIGER P
DEROOIJ NF
Citation: L. Dellmann et al., FABRICATION PROCESS OF HIGH-ASPECT-RATIO ELASTIC AND SU-8 STRUCTURES FOR PIEZOELECTRIC MOTOR APPLICATIONS, Sensors and actuators. A, Physical, 70(1-2), 1998, pp. 42-47