Citation: Pm. Dentinger et Jw. Taylor, INCREASING PLASMA ETCH RESISTANCE OF RESISTS USING FULLERENE ADDITIVES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2575-2581
Citation: Pm. Dentinger et Jw. Taylor, QUANTIFICATION OF THE EXTENT OF REACTION IN A NEGATIVE, NOVOLAC-BASED, CHEMICALLY AMPLIFIED RESIST, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2632-2638