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Authors: BUKOFSKY SJ FEKE GD WU Q GROBER RD DENTINGER PM TAYLOR JW
Citation: Sj. Bukofsky et al., IMAGING OF PHOTOGENERATED ACID IN A CHEMICALLY AMPLIFIED PHOTORESIST, Applied physics letters, 73(3), 1998, pp. 408-410

Authors: DENTINGER PM TAYLOR JW
Citation: Pm. Dentinger et Jw. Taylor, INCREASING PLASMA ETCH RESISTANCE OF RESISTS USING FULLERENE ADDITIVES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2575-2581

Authors: DENTINGER PM TAYLOR JW
Citation: Pm. Dentinger et Jw. Taylor, QUANTIFICATION OF THE EXTENT OF REACTION IN A NEGATIVE, NOVOLAC-BASED, CHEMICALLY AMPLIFIED RESIST, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2632-2638

Authors: DENTINGER PM NELSON CM RHYNER SJ TAYLOR JW FEDYNYSHYN TH CRONIN MF
Citation: Pm. Dentinger et al., RESIST APPLICATION EFFECTS ON CHEMICALLY AMPLIFIED RESIST RESPONSE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4239-4245
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