Authors:
HOLLENSTEIN C
HOWLING AA
COURTEILLE C
MAGNI D
SCHOLZ SM
KROESEN GMW
SIMONS N
DEZEEUW W
SCHWARZENBACH W
Citation: C. Hollenstein et al., SILICON-OXIDE PARTICLE FORMATION IN RF PLASMAS INVESTIGATED BY INFRARED-ABSORPTION SPECTROSCOPY AND MASS-SPECTROMETRY, Journal of physics. D, Applied physics, 31(1), 1998, pp. 74-84