Authors: MEURIS M VERHAVERBEKE S MERTENS PW SCHMIDT HF HEYNS MM KUBOTA M PHILIPOSSIAN A DILLENBECK K GRAF D SCHNEGG A DEBLANK R

Citation: M. Meuris et al., CLEANING TECHNOLOGY FOR IMPROVED GATE OXIDE INTEGRITY, Microelectronic engineering, 22(1-4), 1993, pp. 21-28