Authors:
KIRMSE KHR
WENDT AE
DISCH SB
WU JZ
ABRAHAM IC
MEYER JA
BREUN RA
WOODS RC
Citation: Khr. Kirmse et al., SIO2 TO SI SELECTIVITY MECHANISMS IN HIGH-DENSITY FLUOROCARBON PLASMA-ETCHING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(2), 1996, pp. 710-715