Authors: DOBKIN DM MOKHTARI S SCHMIDT M PANT A ROBINSON L SHERMAN A

Citation: Dm. Dobkin et al., MECHANISMS OF DEPOSITION OF SIO2 FROM TEOS AND RELATED ORGANOSILICON COMPOUNDS AND OZONE, Journal of the Electrochemical Society, 142(7), 1995, pp. 2332-2340

Authors: HITCHENS WR KRUSELL WC DOBKIN DM

Citation: Wr. Hitchens et al., TANTALUM OXIDE THIN-FILMS FOR DIELECTRIC APPLICATIONS BY LOW-PRESSURECHEMICAL-VAPOR-DEPOSITION - PHYSICAL AND ELECTRICAL-PROPERTIES, Journal of the Electrochemical Society, 140(9), 1993, pp. 2615-2621