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Citation: Rl. Melcher et al., DESIGN AND FABRICATION OF A PROTOTYPE PROJECTION DATA MONITOR WITH HIGH INFORMATION-CONTENT, IBM journal of research and development, 42(3-4), 1998, pp. 321-338

Authors: ROSENBLUTH AE DOVE DB DOANY FE SINGH RN YANG KH LU M

Citation: Ae. Rosenbluth et al., CONTRAST PROPERTIES OF REFLECTIVE LIQUID-CRYSTAL LIGHT VALVES IN PROJECTION DISPLAYS, IBM journal of research and development, 42(3-4), 1998, pp. 359-386

Authors: BUDD RA DOVE DB STAPLES JL MARTINO RM FERGUSON RA WEED JT

Citation: Ra. Budd et al., DEVELOPMENT AND APPLICATION OF A NEW TOOL FOR LITHOGRAPHIC MASK EVALUATION, THE STEPPER EQUIVALENT AERIAL IMAGE MEASUREMENT SYSTEM, AIMS, IBM journal of research and development, 41(1-2), 1997, pp. 119-129

Authors: SHIH KK DOVE DB

Citation: Kk. Shih et Db. Dove, THIN-FILM MATERIALS FOR THE PREPARATION OF ATTENUATING PHASE-SHIFT MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(1), 1994, pp. 32-36

Authors: SHIH KK DOVE DB

Citation: Kk. Shih et Db. Dove, DEPOSITION OF ALUMINUM-OXIDE FILMS WITH HIGH REFRACTIVE-INDEX, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(2), 1994, pp. 321-322

Authors: SHIH KK CHIEU TC DOVE DB

Citation: Kk. Shih et al., HAFNIUM DIOXIDE ETCH-STOP LAYER FOR PHASE-SHIFTING MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2130-2131