Authors: DOY TK

Citation: Tk. Doy, ULTRA-PRECISION POLISHING CMP TECHNOLOGY IN FABRICATION PROCESS OF NEXT-GENERATION SEMICONDUCTORS AND ITS APPLICATION, Toraiborojisuto, 42(10), 1997, pp. 755-761

Authors: KASAI T HORIO K YAMAZAKI T KOMODA M DOY TK KUBO N

Citation: T. Kasai et al., POLISHING TO REVEAL MICRO-DEFECTS ON GLASS, Journal of non-crystalline solids, 177, 1994, pp. 397-404