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Results: 2
ULTRA-PRECISION POLISHING CMP TECHNOLOGY IN FABRICATION PROCESS OF NEXT-GENERATION SEMICONDUCTORS AND ITS APPLICATION
Authors:
DOY TK
Citation:
Tk. Doy, ULTRA-PRECISION POLISHING CMP TECHNOLOGY IN FABRICATION PROCESS OF NEXT-GENERATION SEMICONDUCTORS AND ITS APPLICATION, Toraiborojisuto, 42(10), 1997, pp. 755-761
POLISHING TO REVEAL MICRO-DEFECTS ON GLASS
Authors:
KASAI T HORIO K YAMAZAKI T KOMODA M DOY TK KUBO N
Citation:
T. Kasai et al., POLISHING TO REVEAL MICRO-DEFECTS ON GLASS, Journal of non-crystalline solids, 177, 1994, pp. 397-404
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