Authors:
Petersen, R
De Ceuninck, W
De Schepper, L
Vendier, O
Blanck, H
Pons, D
Citation: R. Petersen et al., Determination of the thermal resistance and current exponent of heterojunction bipolar transistors for reliability evaluation, MICROEL REL, 41(9-10), 2001, pp. 1591-1596
Authors:
Dreesen, R
Croes, K
Manca, J
De Ceuninck, W
De Schepper, L
Pergoot, A
Groeseneken, G
Citation: R. Dreesen et al., A new degradation model and lifetime extrapolation technique for lightly doped drain nMOSFETs under hot-carrier degradation, MICROEL REL, 41(3), 2001, pp. 437-443
Authors:
Esch, H
Huyberechts, G
Mertens, R
Maes, G
Manca, J
De Ceuninck, W
De Schepper, L
Citation: H. Esch et al., The stability of Pt heater and temperature sensing elements for silicon integrated tin oxide gas sensors, SENS ACTU-B, 65(1-3), 2000, pp. 190-192
Authors:
d'Haen, J
Van Olmen, J
Beelen, Z
Manca, JV
Martens, T
De Ceuninck, W
d'Olieslaeger, M
De Schepper, L
Cannaerts, M
Maex, K
Citation: J. D'Haen et al., In-situ SEM observation of electromigration in thin metal films at accelerated stress conditions, MICROEL REL, 40(8-10), 2000, pp. 1407-1412
Authors:
Petersen, R
De Ceuninck, W
De Schepper, L
Muraro, JL
Citation: R. Petersen et al., A method to minimize test time for accelerated ageing of pHEMT's by analysis of the electronic fingerprint of the initial stage of degradation, MICROEL REL, 40(8-10), 2000, pp. 1721-1726
Authors:
Dreesen, R
Croes, K
Manca, J
De Ceuninck, W
De Schepper, L
Pergoot, A
Groeseneken, G
Citation: R. Dreesen et al., Modelling hot-carrier degradation of LDD NMOSFETs by using a high-resolution measurement technique., MICROEL REL, 39(6-7), 1999, pp. 785-790
Authors:
D'Haen, J
Cosemans, P
Manca, JV
Lekens, G
Martens, T
De Ceuninck, W
D'Olieslaeger, M
De Schepper, L
Maex, K
Citation: J. D'Haen et al., Dynamics of electromigration induced void/hillock growth and precipitation/dissolution of addition elements studied by in-situ scanning electron microscopy resistance measurements, MICROEL REL, 39(11), 1999, pp. 1617-1630
Authors:
Van Olmen, J
Manca, JV
De Ceuninck, W
De Schepper, L
D'Haeger, V
Witvrouw, A
Maex, K
Vandevelde, B
Beyne, E
Tielemans, L
Citation: J. Van Olmen et al., The kinetics of the early stages of electromigration and concurrent temperature induced processes in thin film metallisations studied by means of an in-situ high resolution resistometric technique, MICROEL REL, 39(11), 1999, pp. 1657-1665