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Results:
1-7
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Results: 7
Authors:
Rahman, M
Deng, LG
van den Berg, J
Wilkinson, CDW
Citation: M. Rahman et al., Minimization of dry etch damage in III-V semiconductors, J PHYS D, 34(18), 2001, pp. 2792-2797
Authors:
Rahman, M
Deng, LG
Wilkinson, CDW
van den Berg, JA
Citation: M. Rahman et al., Studies of damage in low-power reactive-ion etching of III-V semiconductors, J APPL PHYS, 89(4), 2001, pp. 2096-2108
Authors:
Zhang, H
Zelmon, DE
Deng, LG
Liu, HK
Teo, BK
Citation: H. Zhang et al., Optical limiting behavior of nanosized polyicosahedral gold-silver clusters based on third-order nonlinear optical effects, J AM CHEM S, 123(45), 2001, pp. 11300-11301
Authors:
Deng, LG
Rahman, M
Wilkinson, CDW
Citation: Lg. Deng et al., Enhanced damage due to light in low-damage reactive-ion etching processes, APPL PHYS L, 76(20), 2000, pp. 2871-2873
Authors:
Rahman, M
Deng, LG
Boyd, A
Ribayrol, A
Wilkinson, CDW
van den Berg, JA
Armour, DG
Citation: M. Rahman et al., Design considerations for low damage process plasmas, MICROEL ENG, 46(1-4), 1999, pp. 299-302
Authors:
Deng, LG
Rahman, M
van den Berg, JA
Wilkinson, CDW
Citation: Lg. Deng et al., Contribution of atomic and molecular ions to dry-etch damage, APPL PHYS L, 75(2), 1999, pp. 211-213
Authors:
Deng, LG
Rahman, M
Murad, SK
Boyd, A
Wilkinson, CDW
Citation: Lg. Deng et al., Can dry-etching systems be designed for low damage ab initio?, J VAC SCI B, 16(6), 1998, pp. 3334-3338
Risultati:
1-7
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