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Results:
1-8
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Results: 8
Authors:
Hidalgo, H
Tristant, P
Denoirjean, A
Desmaison, J
Citation: H. Hidalgo et al., Microwave plasma enhanced CVD of aluminum oxide films: Influence of the deposition parameter on the films characteristics, J PHYS IV, 11(PR3), 2001, pp. 723-730
Authors:
Tristant, P
Desmaison, J
Naudin, F
Merle, D
Citation: P. Tristant et al., RMPECVD of silica films with a high microwave power (1600 W) parametric studies, J PHYS IV, 11(PR3), 2001, pp. 771-778
Authors:
Tristant, P
Ding, Z
Vinh, QBT
Hidalgo, H
Jauberteau, JL
Desmaison, J
Dong, C
Citation: P. Tristant et al., Microwave plasma enhanced CVD of aluminum oxide films: OES diagnostics andinfluence of the RF bias, THIN SOL FI, 390(1-2), 2001, pp. 51-58
Authors:
Andrievskii, RA
Lavrenko, VA
Desmaison, J
Desmaison-Brut, M
Kalinnikov, GV
Panasyuk, AD
Citation: Ra. Andrievskii et al., High-temperature oxidation of films based on aluminum nitride, DOKL PHYS C, 373(1-3), 2000, pp. 99-101
Authors:
Naudin, F
Tristant, P
Hugon, MC
Jauberteau, I
Agius, B
Desmaison, J
Citation: F. Naudin et al., RMPECVD of silica films in large scale microwave plasma reactor: Films properties, J PHYS IV, 9(P8), 1999, pp. 819-826
Authors:
Foucher, L
Naudin, F
Duverneuil, P
Tixier, C
Desmaison, J
Citation: L. Foucher et al., Study of the precursor injection in a remote microwave PECVD reactor, J PHYS IV, 9(P8), 1999, pp. 141-148
Authors:
Ntsama-Etoundi, MC
Desmaison, J
Tristant, P
Tixier, C
Citation: Mc. Ntsama-etoundi et al., Remote microwave plasma enhanced chemical vapour deposition of alumina on metallic substrates, SURF COAT, 121, 1999, pp. 233-237
Authors:
Lavrenko, VA
Desmaison-Brut, M
Panasyuk, AD
Desmaison, J
Citation: Va. Lavrenko et al., Features of corrosion resistance of AlN-SiC ceramics in air up to 1600 degrees C, J EUR CERAM, 18(16), 1998, pp. 2339-2343
Risultati:
1-8
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