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Citation: A. Rosenbusch et al., Simulation of chemically amplified resist processes for 150 nm e-beam lithography, MICROEL ENG, 46(1-4), 1999, pp. 379-382

Authors: Cui, Z Gerardino, A Gentili, M DiFabrizio, E Prewett, PD

Citation: Z. Cui et al., Comparative study of AZPN114 and SAL601 chemically amplified resists for electron beam nanolithography, J VAC SCI B, 16(6), 1998, pp. 3284-3288