Authors: Weir, BE Alam, MA Bude, JD Silverman, PJ Ghetti, A Baumann, F Diodato, P Monroe, D Sorsch, T Timp, GL Ma, Y Brown, MM Hamad, A Hwang, D Mason, P

Citation: Be. Weir et al., Gate oxide reliability projection to the sub-2 nm regime, SEMIC SCI T, 15(5), 2000, pp. 455-461