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Results:
1-9
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Results: 9
Authors:
Mrosk, JW
Berger, L
Ettl, C
Fecht, HJ
Fischerauer, G
Dommann, A
Citation: Jw. Mrosk et al., Materials issues of SAW sensors for high-temperature applications, IEEE IND E, 48(2), 2001, pp. 258-264
Authors:
Perry, AJ
Bull, SJ
Dommann, A
Michler, M
Wood, BP
Rafaja, D
Matossian, JN
Citation: Aj. Perry et al., The smoothness, hardness and stress in titanium nitride following argon gas cluster ion beam treatment, SURF COAT, 140(2), 2001, pp. 99-108
Authors:
Micheler, M
Dommann, A
Citation: M. Micheler et A. Dommann, Nanohardness measurements for industrial applications, Z METALLKUN, 92(9), 2001, pp. 1035-1039
Authors:
Rosenblad, C
Kummer, M
Dommann, A
Muller, E
Gusso, M
Tapfer, L
von Kanel, H
Citation: C. Rosenblad et al., Virtual substrates for the n- and p-type Si-MODFET grown at very high rates, MAT SCI E B, 74(1-3), 2000, pp. 113-117
Authors:
Perry, AJ
Bull, SJ
Dommann, A
Rafaja, D
Wood, BP
Michler, M
Citation: Aj. Perry et al., The surface damage in titanium nitride associated with lateral sputtering by argon cluster ions, SURF COAT, 133, 2000, pp. 253-258
Authors:
Mukhamedzhanov, E
Kummer, M
Dommann, A
Citation: E. Mukhamedzhanov et al., Triple-crystal diffractometry, x-ray standing wave and reciprocal space mapping study of homoepitaxial grown Si layers, J PHYS D, 33(17), 2000, pp. 2087-2091
Authors:
Rosenblad, C
von Kanel, H
Kummer, M
Dommann, A
Muller, E
Citation: C. Rosenblad et al., A plasma process for ultrafast deposition of SiGe graded buffer layers, APPL PHYS L, 76(4), 2000, pp. 427-429
Authors:
Kacsich, T
Gasser, S
Tsuji, Y
Dommann, A
Nicolet, MA
Nicolet, A
Citation: T. Kacsich et al., Wet oxidation of Ti34Si23B43, J APPL PHYS, 85(3), 1999, pp. 1871-1875
Authors:
Mateeva, E
Deller, HR
Kafader, U
Rosenblad, C
Von Kanel, H
Dommann, A
Citation: E. Mateeva et al., Epitaxial growth of Si by tow-energy DC-plasma chemical vapor deposition, J MAT SCI L, 17(18), 1998, pp. 1545-1547
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1-9
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