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Citation: Hc. Pfeiffer et al., Projection reduction exposure with variable axis immersion lenses: Next generation lithography, J VAC SCI B, 17(6), 1999, pp. 2840-2846

Authors: Golladay, SD Kendall, RA Doran, SK

Citation: Sd. Golladay et al., High emittance source for the PREVAIL projection lithography system, J VAC SCI B, 17(6), 1999, pp. 2856-2859