Authors: Dusch, A Marcon, J Masmoudi, K Olivie, F Benzohra, M Ketata, K Ketata, M

Citation: A. Dusch et al., Modeling of the transient enhanced diffusion of boron implanted into preamorphized silicon: the case of BF2+ implantation, MAT SCI E B, 80(1-3), 2001, pp. 65-67