Authors:
Lebert, R
Aschke, L
Bergmann, K
Dusterer, S
Gabel, K
Hoffmann, D
Loosen, P
Neff, W
Nickles, P
Rosier, O
Poprawe, R
Rudolph, D
Sandner, W
Sauerbrey, R
Schmahl, G
Schwoerer, H
Stiehl, H
Will, I
Ziener, C
Citation: R. Lebert et al., Preliminary results from key experiments on sources for EUV lithography, MICROEL ENG, 57-8, 2001, pp. 87-92