Authors: ARTHUR G MACK CA EILBECK N MARTIN B

Citation: G. Arthur et al., ANALYZING THE DISSOLUTION CHARACTERISTICS OF DEEP UV CHEMICALLY AMPLIFIED PHOTORESIST, Microelectronic engineering, 42, 1998, pp. 311-314

Authors: ARTHUR G EILBECK N MARTIN B

Citation: G. Arthur et al., EFFECT OF TEMPERATURE-VARIATIONS IN THE POSTEXPOSURE PROCESSES OF OPTICAL LITHOGRAPHY, Microelectronic engineering, 35(1-4), 1997, pp. 137-140