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Results: 1
PRODUCTION OF SILICON OXYNITRIDE LAYERS BY USE OF HEXAMETHYLDISILAZANE AND NITROGEN(I) OXIDE
Authors:
KHRAMOVA LV SMIRNOVA TP EREMINA EG
Citation:
Lv. Khramova et al., PRODUCTION OF SILICON OXYNITRIDE LAYERS BY USE OF HEXAMETHYLDISILAZANE AND NITROGEN(I) OXIDE, Inorganic materials, 28(8), 1992, pp. 1329-1332
Risultati:
1-1
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