Authors:
GOSS SH
GRAZULIS L
TOMICH DH
EYINK KG
WALCK SD
HAAS TW
THOMAS DR
LAMPERT WV
Citation: Sh. Goss et al., MECHANICAL LITHOGRAPHY USING A SINGLE-POINT DIAMOND MACHINING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1439-1445
Authors:
TOMICH DH
EYINK KG
SEAFORD ML
TAFERNER WF
TU CW
LAMPERT WV
Citation: Dh. Tomich et al., ATOMIC-FORCE MICROSCOPY CORRELATED WITH SPECTROSCOPIC ELLIPSOMETRY DURING HOMEPITAXIAL GROWTH ON GAAS(111)B SUBSTRATES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1479-1483
Authors:
EYINK KG
SEAFORD ML
HAAS TW
TOMICH DH
LAMPERT WV
WALCK SD
SOLOMON JS
MITCHEL WC
EASTMAN LF
Citation: Kg. Eyink et al., CHARACTERIZATION OF LOW-TEMPERATURE-GROWN ALSB AND GASB BUFFER LAYERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(4), 1997, pp. 1187-1190
Authors:
EYINK KG
CAPANO MA
WALCK SD
HAAS TW
STREETMAN BG
Citation: Kg. Eyink et al., A COMPARISON OF THE CRITICAL THICKNESS FOR MBE GROWN LT-GAAS DETERMINED BY IN-SITU ELLIPSOMETRY AND TRANSMISSION ELECTRON-MICROSCOPY, Journal of electronic materials, 26(4), 1997, pp. 391-396
Authors:
EYINK KG
CAPANO MA
WALCK SD
HAAS TW
STREETMAN BG
Citation: Kg. Eyink et al., IN-SITU AND EX-SITU SPECTROSCOPIC INVESTIGATION OF LOW-TEMPERATURE-GROWN GALLIUM-ARSENIDE BY MOLECULAR-BEAM EPITAXY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(3), 1996, pp. 2278-2281
Authors:
PARK GH
PAO YH
IGELNIK B
EYINK KG
LECLAIR SR
Citation: Gh. Park et al., NEURAL-NET COMPUTING FOR INTERPRETATION OF SEMICONDUCTOR FILM OPTICALELLIPSOMETRY PARAMETERS, IEEE transactions on neural networks, 7(4), 1996, pp. 816-829
Authors:
EYINK KG
CONG YS
GILBERT R
CAPANO MA
HAAS TW
STREETMAN BG
Citation: Kg. Eyink et al., IN-SITU ELLIPSOMETRIC STUDY OF AS CAPPING AND LOW-TEMPERATURE MOLECULAR-BEAM EPITAXY GAAS GROWTH AND IMPLICATIONS FOR THE LOW-TEMPERATURE CRITICAL THICKNESS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(4), 1993, pp. 1423-1426
Citation: Od. Patterson et al., REAL-TIME, HEURISTIC-BASED CONTROL OF MOLECULAR-BEAM EPITAXY, Journal of materials engineering and performance, 2(5), 1993, pp. 715-720
Authors:
EYINK KG
CONG YS
CAPANO MA
HAAS TW
GILBERT RA
STREETMAN BG
Citation: Kg. Eyink et al., OBSERVATION OF LOW-T GAAS GROWTH REGIMES BY REAL-TIME ELLIPSOMETRY, Journal of electronic materials, 22(12), 1993, pp. 1387-1390