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Citation: Bee. Kastenmeier et al., Surface etching mechanism of silicon nitride in fluorine and nitric oxide containing plasmas, J VAC SCI A, 19(1), 2001, pp. 25-30

Authors: Ellefson, RE Miiller, AP

Citation: Re. Ellefson et Ap. Miiller, Recommended practice for calibrating vacuum gauges of the thermal conductivity type, J VAC SCI A, 18(5), 2000, pp. 2568-2577

Authors: Li, X Schaepkens, M Oehrlein, GS Ellefson, RE Frees, LC Mueller, N Korner, N

Citation: X. Li et al., Mass spectrometric measurements on inductively coupled fluorocarbon plasmas: Positive ions, radicals and endpoint detection, J VAC SCI A, 17(5), 1999, pp. 2438-2446