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Citation: Cy. Nakakura et al., Observation of metal-oxide-semiconductor transistor operation using scanning capacitance microscopy, APPL PHYS L, 75(15), 1999, pp. 2319-2321

Authors: Nelson, MW Schroeder, PG Schlaf, R Parkinson, BA Almgren, CW Erickson, AN

Citation: Mw. Nelson et al., Spatially resolved dopant profiling of patterned Si wafers by bias-appliedphase-imaging tapping-mode atomic force microscopy, APPL PHYS L, 74(10), 1999, pp. 1421-1423