Authors:
Cresswell, MW
Bonevich, JE
Allen, RA
Guillaume, NMP
Giannuzzi, LA
Everist, SC
Murabito, CE
Shea, PJ
Linholm, LW
Citation: Mw. Cresswell et al., Electrical linewidth test structures patterned in (100) silicon-on-insulator for use as CD standards, IEEE SEMIC, 14(4), 2001, pp. 356-364
Citation: Ra. Allen et al., High-resolution transmission electron microscopy calibration of critical dimension (CD) reference materials, IEEE SEMIC, 14(1), 2001, pp. 26-31