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LU X
IYER SSK
LEE J
DOYLE B
FAN ZN
CHU PK
HU CM
CHEUNG NW
Citation: X. Lu et al., PLASMA IMMERSION ION-IMPLANTATION FOR SOI SYNTHESIS - SIMOX AND ION-CUT, Journal of electronic materials, 27(9), 1998, pp. 1059-1066
Authors:
FAN ZN
ZHAO G
CHU PK
JIN ZH
KWOK HS
WONG M
Citation: Zn. Fan et al., FLOATING LOW-TEMPERATURE RADIOFREQUENCY PLASMA OXIDATION OF POLYCRYSTALLINE SILICON-GERMANIUM, Applied physics letters, 73(3), 1998, pp. 360-362
Citation: Zn. Fan et al., SAMPLE STAGE INDUCED DOSE AND ENERGY NONUNIFORMITY IN PLASMA IMMERSION ION-IMPLANTATION OF SILICON, Applied physics letters, 73(2), 1998, pp. 202-204
Authors:
IYER SSK
LU X
LIU JB
MIN J
FAN ZN
CHU PK
HU CM
CHEUNG NW
Citation: Ssk. Iyer et al., SEPARATION BY PLASMA IMPLANTATION OF OXYGEN (SPIMOX) OPERATIONAL PHASE-SPACE, IEEE transactions on plasma science, 25(5), 1997, pp. 1128-1135
Citation: Zn. Fan et al., EXPANDABLE THERMAL-SHAPED MEMORY METAL ESOPHAGEAL STENT - EXPERIENCESWITH A NEW NITINOL STENT IN 129 PATIENTS, Gastrointestinal endoscopy, 46(4), 1997, pp. 352-357