Authors:
ONYIRIUKA EC
MOORE CB
FEHLNER FP
BINKOWSKI NJ
SALAMIDA D
KING TJ
COUILLARD JG
Citation: Ec. Onyiriuka et al., EFFECT OF RCA CLEANING ON THE SURFACE-CHEMISTRY OF GLASS AND POLYSILICON FILMS AS STUDIED BY TOF-SIMS AND XPS, Surface and interface analysis, 26(4), 1998, pp. 270-277