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Results: 1-7 |
Results: 7

Authors: ANCEL A FETTER L GROSCOLAS R
Citation: A. Ancel et al., CHANGES IN EGG AND BODY-TEMPERATURE INDICATE TRIGGERING OF EGG DESERTION AT A BODY-MASS THRESHOLD IN FASTING INCUBATING BLUE PETRELS (HALOBAENA-CAERULEA), Journal of comparative physiology. B, Biochemical, systemic, and environmental physiology, 168(7), 1998, pp. 533-539

Authors: HARRIOTT LR BERGER SD BIDDICK C BLAKEY MI BOWLER SW BRADY K CAMARDA RM CONNELLY WF CRORKEN A CUSTY J DEMARCO R FARROW RC FELKER JA FETTER L FREEMAN R HOPKINS L HUGGINS HA KNUREK CS KRAUS JS LIDDLE JA MKRTYCHAN M NOVEMBRE AE PEABODY ML TARASCON RG WADE HH WASKIEWICZ WK WATSON GP WERDER KS WINDT D
Citation: Lr. Harriott et al., THE SCALPEL PROOF-OF-CONCEPT SYSTEM, Microelectronic engineering, 35(1-4), 1997, pp. 477-480

Authors: HARRIOTT LR BERGER SD BIDDICK C BLAKEY MI BOWLER SW BRADY K CAMARDA RM CONNELLY WF CRORKEN A CUSTY J DIMARCO R FARROW RC FELKER JA FETTER L FREEMAN R HOPKINS L HUGGINS HA KNUREK CS KRAUS JS LIDDLE JA MKRTYCHAN M NOVEMBRE AE PEABODY ML TARASCON RG WADE HH WASKIEWICZ WK WATSON GP WERDER KS WINDT D
Citation: Lr. Harriott et al., PRELIMINARY-RESULTS FROM A PROTOTYPE PROJECTION ELECTRON-BEAM STEPPER-SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY PROOF-OF-CONCEPT SYSTEM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3825-3828

Authors: WATSON GP FU D BERGER SD TENNANT D FETTER L NOVEMBRE A BIDDICK C
Citation: Gp. Watson et al., MEASUREMENT OF THE BACKSCATTER COEFFICIENT USING RESIST RESPONSE CURVES FOR 20-100 KEV ELECTRON-BEAM LITHOGRAPHY ON SI, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4277-4282

Authors: TARASCON RG NOVEMBRE AE BOLAN K BLAKEY M KNUREK C FETTER L HUGGINS HA LIDDLE JA NALAMASU O
Citation: Rg. Tarascon et al., LITHOGRAPHIC EVALUATION OF A POSITIVE-ACTING CHEMICALLY AMPLIFIED RESIST SYSTEM UNDER CONVENTIONAL AND PROJECTION ELECTRON-BEAM EXPOSURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2975-2979

Authors: WOOD OR BJORKHOLM JE FETTER L HIMEL MD TENNANT DM MACDOWELL AA LAFONTAINE B GRIFFITH JE TAYLOR GN WASKIEWICZ WK WINDT DL KORTRIGHT JB GULLIKSON EK NGUYEN K
Citation: Or. Wood et al., WAVELENGTH DEPENDENCE OF THE RESIST SIDEWALL ANGLE IN EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3841-3845

Authors: FARROW RC LIDDLE JA BERGER SD HUGGINS HA KRAUS JS CAMARDA RM TARASCON RG JURGENSEN CW KOLA RR FETTER L
Citation: Rc. Farrow et al., MARKS FOR ALIGNMENT AND REGISTRATION IN PROJECTION ELECTRON LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2175-2178
Risultati: 1-7 |