Authors: SHARMA R FRETWELL JL DORIS B BANERJEE S

Citation: R. Sharma et al., USE OF METAL-OXIDE-SEMICONDUCTOR CAPACITORS IN THE ANALYSIS OF LOW-TEMPERATURE EPITAXIAL SI FILMS DEPOSITED BY REMOTE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Journal of applied physics, 82(5), 1997, pp. 2684-2689