Authors: NOEL S VENTURA L SLAOUI A MULLER JC GROH B SCHINDLER R FROSCHLE B THEILER T

Citation: S. Noel et al., IMPACT OF ULTRAVIOLET-LIGHT DURING RAPID THERMAL-DIFFUSION, Applied physics letters, 72(20), 1998, pp. 2583-2585

Authors: LEUTENECKER R FROSCHLE B RAMM P

Citation: R. Leutenecker et al., TITANIUM MONOPHOSPHIDE (TIP) LAYERS AS POTENTIAL DIFFUSION-BARRIERS, Microelectronic engineering, 37-8(1-4), 1997, pp. 397-402

Authors: SAUTER M BERTAGNOLLI E KNAPEK E STEMMER A FROSCHLE B EISELE I KLOSE H

Citation: M. Sauter et al., APPLICATION OF ELECTRON-BEAM LITHOGRAPHY FOR DOWNSCALING OF SOI-BIPOLAR AND BICMOS, Microelectronic engineering, 30(1-4), 1996, pp. 31-34

Authors: RUHL G FROSCHLE B RAMM P INTEMANN A PAMLER W

Citation: G. Ruhl et al., DEPOSITION OF TITANIUM NITRIDE TUNGSTEN LAYERS FOR APPLICATION IN VERTICALLY INTEGRATED-CIRCUITS TECHNOLOGY/, Applied surface science, 91(1-4), 1995, pp. 382-387

Authors: LEUTENECKER R FROSCHLE B CAOMINH U RAMM P

Citation: R. Leutenecker et al., TITANIUM NITRIDE FILMS FOR BARRIER APPLICATIONS PRODUCED BY RAPID THERMAL CVD AND SUBSEQUENT IN-SITU ANNEALING, Thin solid films, 270(1-2), 1995, pp. 621-626