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Results: 1-4 |
Results: 4
EXPERIMENTAL-STUDY OF THE DEGRADATION OF MECHANICAL STRENGTH OF SILICON-WAFERS CAUSED BY LARGE-SCALE INTEGRATION PROCESSES
Authors: YAGISHITA A FUJII O NUMANO M KAWAMURA N IWASE M USHIKU Y ARIKADO T
Citation: A. Yagishita et al., EXPERIMENTAL-STUDY OF THE DEGRADATION OF MECHANICAL STRENGTH OF SILICON-WAFERS CAUSED BY LARGE-SCALE INTEGRATION PROCESSES, Journal of the Electrochemical Society, 145(9), 1998, pp. 3160-3164
300 MM DIAMETER HYDROGEN ANNEALED SILICON-WAFERS
Authors: TAKEDA R XIN P YOSHIKAWA J KIRINO Y MATSUSHITA Y HOSOKI Y TSUCHIYA N FUJII O
Citation: R. Takeda et al., 300 MM DIAMETER HYDROGEN ANNEALED SILICON-WAFERS, Journal of the Electrochemical Society, 144(10), 1997, pp. 280-282
DEVELOPMENT OF 500-KV XLPE CABLES AND ACCESSORIES FOR LONG-DISTANCE UNDERGROUND TRANSMISSION-LINES .5. LONG-TERM PERFORMANCE FOR 500-KV XLPE CABLES AND JOINTS
Authors: KAMINAGA K ICHIHARA M JINNO M FUJII O FUKUNAGA S KOBAYASHI M WATANABE K
Citation: K. Kaminaga et al., DEVELOPMENT OF 500-KV XLPE CABLES AND ACCESSORIES FOR LONG-DISTANCE UNDERGROUND TRANSMISSION-LINES .5. LONG-TERM PERFORMANCE FOR 500-KV XLPE CABLES AND JOINTS, IEEE transactions on power delivery, 11(3), 1996, pp. 1185-1194
DEVELOPMENT OF LSI LR-37646 FOR MINI DISC SYSTEM
Authors: HAIKAWA Y NOGUCHI M FUJII O ISHIZAKI H MINODA H YAMAMOTO H
Citation: Y. Haikawa et al., DEVELOPMENT OF LSI LR-37646 FOR MINI DISC SYSTEM, Sharp giho, (66), 1996, pp. 43-46
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