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THE INITIAL PHOTOCHEMICAL PROCESS OF TRIOSMIUMDODECACARBONYL ADSORBEDON THE SURFACE OF SILICA AS STUDIED BY PICOSECOND DIFFUSE-REFLECTANCELASER PHOTOLYSIS AND MATRIX-ISOLATION
Authors: YAMAMOTO S MIZUMA H NITTA A FUKAZAWA N FUKUMURA H MASUHARA H
Citation: S. Yamamoto et al., THE INITIAL PHOTOCHEMICAL PROCESS OF TRIOSMIUMDODECACARBONYL ADSORBEDON THE SURFACE OF SILICA AS STUDIED BY PICOSECOND DIFFUSE-REFLECTANCELASER PHOTOLYSIS AND MATRIX-ISOLATION, Chemical physics letters, 215(4), 1993, pp. 323-328
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