Authors:
Falkenstein, Z
Walter, KC
Nastasi, MA
Rej, DJ
Gavrilov, NV
Citation: Z. Falkenstein et al., Surface modification of aluminum and chromium by ion implantation of nitrogen with a high current density ion implanter and plasma-source ion implantation, J MATER RES, 14(11), 1999, pp. 4351-4357
Citation: Z. Falkenstein, Ozone formation with (V)UV-enhanced dielectric barrier discharges in dry and humid gas mixtures of O-2, N-2/O-2, and Ar/O-2, OZONE-SCI E, 21(6), 1999, pp. 583-603
Citation: Z. Falkenstein, Effects of the O-2 concentration on the removal efficiency of volatile organic compounds with dielectric barrier discharges in Ar and N-2, J APPL PHYS, 85(1), 1999, pp. 525-529