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Results: 1-4 |
Results: 4

Authors: Bruenger, WH Torkler, M Dzionk, C Terris, BD Folks, L Weller, D Rothuizen, H Vettiger, P Stangl, G Fallmann, W
Citation: Wh. Bruenger et al., Ion projection lithography for resistless patterning of thin magnetic films, MICROEL ENG, 53(1-4), 2000, pp. 605-608

Authors: Bruenger, WH Torkler, M Weiss, M Loschner, H Leung, K Lee, Y Hudek, P Rangelow, IW Stangl, G Fallmann, W
Citation: Wh. Bruenger et al., Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices, J VAC SCI B, 17(6), 1999, pp. 3119-3121

Authors: Szmanda, CR Brainard, RL Mackevich, JF Awaji, A Tanaka, T Yamada, Y Bohland, J Tedesco, S Dal'Zotto, B Bruenger, W Torkler, M Fallmann, W Loeschner, H Kaesmaier, R Nealey, PM Pawloski, AR
Citation: Cr. Szmanda et al., Measuring acid generation efficiency in chemically amplified resists with all three beams, J VAC SCI B, 17(6), 1999, pp. 3356-3361

Authors: Bruenger, WH Torkler, M Leung, KN Lee, Y Williams, MD Loeschner, H Stengl, G Fallmann, W Paschke, F Stangl, G Rangelow, IW Hudek, P
Citation: Wh. Bruenger et al., Resolution improvement of ion projector with a low energy spread multicuspion source, MICROEL ENG, 46(1-4), 1999, pp. 477-480
Risultati: 1-4 |