Authors: Ducroquet, F Achard, H Coudert, F Previtali, B Lugand, JF Ulmer, L Farjot, T Gobil, Y Heitzmann, M Tedesco, S Nier, ME Deleonibus, S

Citation: F. Ducroquet et al., Full CMP integration of CVD TiN damascene sub-0.1-mu m metal gate devices for ULSI applications, IEEE DEVICE, 48(8), 2001, pp. 1816-1821