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Results:
1-2
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Results: 2
Authors:
Spitzmuller, J
Fehrenbacher, M
Rauscher, H
Behm, RJ
Citation: J. Spitzmuller et al., Nucleation and growth kinetics in semiconductor chemical vapor deposition - art. no. 041302, PHYS REV B, 6304(4), 2001, pp. 1302
Authors:
Fehrenbacher, M
Rauscher, H
Behm, RJ
Citation: M. Fehrenbacher et al., Self-limited SiH2Cl2 gas source molecular beam epitaxy on Si(100), SURF SCI, 491(1-2), 2001, pp. 275-299
Risultati:
1-2
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