Authors:
Fendrych, F
Pajasova, L
Wagner, T
Jastrabik, L
Chvostova, D
Soukup, L
Rusnak, K
Citation: F. Fendrych et al., CNx coatings sputtered by DC magnetron: hardness, nitrogenation and optical properties, DIAM RELAT, 8(8-9), 1999, pp. 1711-1714
Authors:
Fendrych, F
Soukup, L
Jastrabik, L
Sicha, M
Hubicka, Z
Chvostova, D
Tarasenko, A
Studnicka, V
Wagner, T
Citation: F. Fendrych et al., Cu3N films prepared by the low-pressure r.f. supersonic plasma jet reactor: Structure and optical properties, DIAM RELAT, 8(8-9), 1999, pp. 1715-1719
Authors:
Shaginyan, LR
Fendrych, F
Jastrabik, L
Soukup, L
Kulikovsky, VY
Musil, J
Citation: Lr. Shaginyan et al., CNxHy films obtained by ECR plasma activated CVD: The role of substrate bias (DC, RF) and some other deposition parameters in growth mechanisms, SURF COAT, 119, 1999, pp. 65-73
Authors:
Soukup, L
Sicha, M
Fendrych, F
Jastrabik, L
Hubicka, Z
Chvostova, D
Sichova, H
Valvoda, V
Tarasenko, A
Studnicka, V
Wagner, T
Novak, M
Citation: L. Soukup et al., Copper nitride thin films prepared by the RF plasma chemical reactor with low pressure supersonic single and multi-plasma jet system, SURF COAT, 119, 1999, pp. 321-326
Authors:
Shaginyan, LR
Onoprienko, AA
Vereschaka, VM
Fendrych, F
Vysotsky, VG
Citation: Lr. Shaginyan et al., Role of ion bombardment in forming CNx and CNxHy films deposited by r.f.-magnetron reactive sputtering and ECR plasma-activated CVD methods, SURF COAT, 113(1-2), 1999, pp. 134-139