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Citation: M. Posselt et al., Atomistic simulation of ion implantation and its application in Si technology, MAT SCI E B, 71, 2000, pp. 128-136

Authors: Suzuki, K Sudo, R Feudel, T Fichtner, W

Citation: K. Suzuki et al., Compact and comprehensive database for ion-implanted as profile, IEEE DEVICE, 47(1), 2000, pp. 44-49