Authors:
Jiang, ZX
Backer, S
Lee, JJ
Wu, LY
Guenther, T
Sieloff, D
Choi, P
Foisy, M
Alkemade, PFA
Citation: Zx. Jiang et al., Approach to the characterization of through-oxide boron implantation by secondary ion mass spectrometry, J VAC SCI B, 19(4), 2001, pp. 1133-1137
Authors:
Wang, XD
Mahaffy, R
Tan, K
Shih, CK
Lee, JJ
Foisy, M
Citation: Xd. Wang et al., Two-dimensional dopant profile of 0.2 mu m metal-oxide-semiconductor fieldeffect transistors, J VAC SCI B, 18(1), 2000, pp. 560-565