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Results: 1-11 |
Results: 11

Authors: Hirato, T Fransaer, J Celis, JP
Citation: T. Hirato et al., Electrolytic codeposition of silica particles with aluminum from AlCl3-dimethylsulfone electrolytes, J ELCHEM SO, 148(4), 2001, pp. C280-C283

Authors: Dedeloudis, C Fransaer, J Celis, JP
Citation: C. Dedeloudis et al., Surface force measurements at a copper electrode/electrolyte interface, J PHYS CH B, 104(9), 2000, pp. 2060-2066

Authors: Spaepen, F Fransaer, J
Citation: F. Spaepen et J. Fransaer, Advances in modeling of crystal nucleation from the melt, ADV ENG MAT, 2(9), 2000, pp. 593-596

Authors: Ruythooren, W Attenborough, K Beerten, S Merken, P Fransaer, J Beyne, E Van Hoof, C De Boeck, J Celis, JP
Citation: W. Ruythooren et al., Electrodeposition for the synthesis of microsystems, J MICROM M, 10(2), 2000, pp. 101-107

Authors: Fransaer, J Wagner, AV Spaepen, F
Citation: J. Fransaer et al., Solidification of Ga-Mg-Zn in a gas-filled drop tube: Experiments and modeling, J APPL PHYS, 87(4), 2000, pp. 1801-1818

Authors: Nowak, P Socha, RP Kaisheva, M Fransaer, J Celis, JP Stoinov, Z
Citation: P. Nowak et al., Electrochemical investigation of the codeposition of SiC and SiO2 particles with nickel, J APPL ELEC, 30(4), 2000, pp. 429-437

Authors: Vaes, J Fransaer, J Celis, JP
Citation: J. Vaes et al., The role of metal hydroxides in NiFe deposition, J ELCHEM SO, 147(10), 2000, pp. 3718-3724

Authors: Terzieva, V Fransaer, J Celis, JP
Citation: V. Terzieva et al., Codeposition of hydrophilic and hydrophobic silica with copper from acid copper sulfate baths, J ELCHEM SO, 147(1), 2000, pp. 198-202

Authors: Dedeloudis, C Kaisheva, MK Muleshkov, N Muleshkov, T Nowak, P Fransaer, J Celis, JP
Citation: C. Dedeloudis et al., Electrolytic codeposition of submicron silicon carbide with nickel, PLAT SURF F, 86(8), 1999, pp. 57-60

Authors: Herlach, DM Holland-Moritz, D Schenk, T Schneider, K Wilde, G Boni, O Fransaer, J Spaepen, F
Citation: Dm. Herlach et al., Undercoolability of pure Co and Co-based alloys, J NON-CRYST, 250, 1999, pp. 271-276

Authors: Cerisier, M Attenborough, K Fransaer, J Van Haesendonck, C Celis, JP
Citation: M. Cerisier et al., Growth mode of copper films electrodeposited on silicon from sulfate and pyrophosphate solutions, J ELCHEM SO, 146(6), 1999, pp. 2156-2162
Risultati: 1-11 |