Authors: TALOR JW GAMSKY C RHYNER S HOWES G DENTINGER P NELSON C YANG C REILLY M

Citation: Jw. Talor et al., PROCESSING CONTROL FOR 0.25 MU-M X-RAY-EXPOSURES OF COMMERCIALLY AVAILABLE RESISTS - THE POTENTIAL FOR ADAPTIVE-CONTROL, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3078-3081