Authors:
JAIN A
GELATOS AV
KODAS TT
HAMPDENSMITH MJ
MARSH R
MOGAB CJ
Citation: A. Jain et al., SELECTIVE CHEMICAL-VAPOR-DEPOSITION OF COPPER USING (HFAC) COPPER(I) VINYLTRIMETHYLSILANE IN THE ABSENCE AND PRESENCE OF WATER, Thin solid films, 262(1-2), 1995, pp. 52-59
Citation: Av. Gelatos et al., CHEMICAL-VAPOR-DEPOSITION OF COPPER FROM CU-VAPOR(1 PRECURSORS IN THEPRESENCE OF WATER), Applied physics letters, 63(20), 1993, pp. 2842-2844