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Results: 5

Authors: GEVELBER MA BUFANO M TOLEDOQUINONES M
Citation: Ma. Gevelber et al., DYNAMIC MODELING ANALYSIS FOR CONTROL OF CHEMICAL-VAPOR-DEPOSITION, Journal of dynamic systems, measurement, and control, 120(2), 1998, pp. 164-169

Authors: NARENDRA KS SMITH CW GEVELBER MA
Citation: Ks. Narendra et al., ANALYSIS OF INDUCTION PLASMA DEPOSITION DYNAMICS FOR CONTROL, Journal of dynamic systems, measurement, and control, 117(3), 1995, pp. 429-431

Authors: SMITH CW NARENDRA KS GEVELBER MA
Citation: Cw. Smith et al., MODELING FOR CONTROL OF INDUCTION PLASMA DEPOSITION, Chemical Engineering Science, 50(23), 1995, pp. 3747-3761

Authors: GEVELBER MA
Citation: Ma. Gevelber, DYNAMICS AND CONTROL OF THE CZOCHRALSKI PROCESS .3. INTERFACE DYNAMICS AND CONTROL REQUIREMENTS, Journal of crystal growth, 139(3-4), 1994, pp. 271-285

Authors: GEVELBER MA
Citation: Ma. Gevelber, DYNAMICS AND CONTROL OF THE CZOCHRALSKI PROCESS .4. CONTROL-STRUCTUREDESIGN FOR INTERFACE SHAPE CONTROL AND PERFORMANCE EVALUATION, Journal of crystal growth, 139(3-4), 1994, pp. 286-301
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