Authors: GREGORY HJ BONAR JM ASHBURN P PARKER GJ

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Authors: MOUIS M GREGORY HJ DENORME S MATHIOT D ASHBURN P ROBBINS DJ GLASPER JL

Citation: M. Mouis et al., PHYSICAL MODELING OF THE ENHANCED DIFFUSION OF BORON DUE TO ION-IMPLANTATION IN THIN-BASE NPN BIPOLAR-TRANSISTORS, Microelectronics, 26(2-3), 1995, pp. 255-259