Authors:
LUCIANI L
DIFABRIZIO E
GRELLA L
BACIOCCHI M
FIGLIOMENI M
GENTILI M
MASTROGIACOMO L
MAGGIORA R
KRASPENOVA A
REILLY M
Citation: L. Luciani et al., METROLOGY FOR REPLICATED X-RAY MASKS USING AN ELECTRON-BEAM MACHINE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2463-2467
Authors:
GENTILI M
GRELLA L
DIFABRIZIO E
LUCIANI L
BACIOCCHI M
FIGLIOMENI M
MAGGIORA R
MASTROGIACOMO L
CERRINA F
Citation: M. Gentili et al., DEVELOPMENT OF AN ELECTRON-BEAM PROCESS FOR THE FABRICATION OF X-RAY NANOMASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2938-2942
Authors:
MENEGHINI G
BOSCHIS L
CORIASSO C
STANO A
GENTILI M
GRELLA L
FIGLIOMENI M
Citation: G. Meneghini et al., CH4 H2 RIE OF INGAASP/INP MATERIALS - AN APPLICATION TO DFB LASER FABRICATION/, Microelectronic engineering, 21(1-4), 1993, pp. 321-324