Results: 1-7 |
Results: 7
130 nm and 150 nm line-and-space critical-dimension control evaluation using XS-1 x-ray stepper
Authors: Tanaka, Y Taguchi, T Fujii, K Tsuboi, S Yamabe, M Suzuki, K Gomei, Y Hisatsugu, T Fukuda, M Morita, H
Citation: Y. Tanaka et al., 130 nm and 150 nm line-and-space critical-dimension control evaluation using XS-1 x-ray stepper, J VAC SCI B, 16(6), 1998, pp. 3509-3514
A proposal of high power EUV lithography illumination system using synchrotron radiation
Authors: Gomei, Y
Citation: Y. Gomei, A proposal of high power EUV lithography illumination system using synchrotron radiation, MICROEL ENG, 53(1-4), 2000, pp. 663-666
Design of beamline optics for large-field exposure
Authors: Hasegawa, M Gomei, Y Hisatsugu, T
Citation: M. Hasegawa et al., Design of beamline optics for large-field exposure, JPN J A P 1, 37(12B), 1998, pp. 6845-6850
Development of the large field extreme ultraviolet lithography camera
Authors: Watanabe, T Kinoshita, H Nii, H Li, Y Hamamoto, K Oshino, T Sugisaki, K Murakami, K Irie, S Shirayone, S Gomei, Y Okazaki, S
Citation: T. Watanabe et al., Development of the large field extreme ultraviolet lithography camera, J VAC SCI B, 18(6), 2000, pp. 2905-2910
Evaluation of image shortening for rectangular array patterns in X-ray lithography
Authors: Mitsui, S Tanaka, Y Taguchi, T Gomei, Y Hisatsugu, T
Citation: S. Mitsui et al., Evaluation of image shortening for rectangular array patterns in X-ray lithography, JPN J A P 1, 37(12B), 1998, pp. 6799-6803
First operation of 11 m long undulator at NewSUBARU
Authors: Hashimoto, S Ando, A Niibe, M Miyamoto, S Shoji, Y Fukuda, Y Tanaka, T Gomei, Y
Citation: S. Hashimoto et al., First operation of 11 m long undulator at NewSUBARU, NUCL INST A, 467, 2001, pp. 141-144
Low-dose exposure technique for 100-nm-diam hole replication in x-ray lithography
Authors: Fujii, K Tanaka, Y Taguchi, T Yamabe, M Suzuki, K Gomei, Y Hisatsugu, T
Citation: K. Fujii et al., Low-dose exposure technique for 100-nm-diam hole replication in x-ray lithography, J VAC SCI B, 16(6), 1998, pp. 3504-3508
Risultati: 1-7 |