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Results: 1-8 |
Results: 8

Authors: Goyette, AN Wang, YC Olthoff, JK
Citation: An. Goyette et al., Ion compositions and energies in inductively coupled plasmas containing SF6, J VAC SCI A, 19(4), 2001, pp. 1294-1297

Authors: Goyette, AN de Urquijo, J Wang, YC Christophorou, LG Olthoff, JK
Citation: An. Goyette et al., Electron transport, ionization, and attachment coefficients in C2F4 and C2F4/Ar mixtures, J CHEM PHYS, 114(20), 2001, pp. 8932-8937

Authors: Bhattacharyya, S Auciello, O Birrell, J Carlisle, JA Curtiss, LA Goyette, AN Gruen, DM Krauss, AR Schlueter, J Sumant, A Zapol, P
Citation: S. Bhattacharyya et al., Synthesis and characterization of highly-conducting nitrogen-doped ultrananocrystalline diamond films, APPL PHYS L, 79(10), 2001, pp. 1441-1443

Authors: Anderson, LW Goyette, AN Lawler, JE
Citation: Lw. Anderson et al., Uses of high-sensitivity white-light absorption spectroscopy in chemical vapor deposition and plasma processing, ADV ATOM MO, 43, 2000, pp. 295-339

Authors: Goyette, AN Wang, YC Misakian, M Olthoff, JK
Citation: An. Goyette et al., Ion fluxes and energies in inductively coupled radio-frequency discharges containing C2F6 and c-C4F8, J VAC SCI A, 18(6), 2000, pp. 2785-2790

Authors: Goyette, AN Wang, YC Olthoff, JK
Citation: An. Goyette et al., Inductively coupled plasmas in low global-warming-potential gases, J PHYS D, 33(16), 2000, pp. 2004-2009

Authors: Wang, YC Misakian, M Goyette, AN Olthoff, JK
Citation: Yc. Wang et al., Ion fluxes and energies in inductively coupled radio-frequency discharges containing CHF3, J APPL PHYS, 88(10), 2000, pp. 5612-5617

Authors: Goyette, AN Anderson, LW Peck, JR Lawler, JE
Citation: An. Goyette et al., Measurement of C6H6 densities in a diamond deposition system, J CHEM PHYS, 110(9), 1999, pp. 4647-4650
Risultati: 1-8 |