Authors: Filippi, RG Gribelyuk, MA Joseph, T Kane, T Sullivan, TD Clevenger, LA Costrini, G Gambino, J Iggulden, RC Kiewra, EW Ning, XJ Ravikumar, R Schnabel, RF Stojakovic, G Weber, SJ Gignac, LM Hu, CK Rath, DL Rodbell, KP

Citation: Rg. Filippi et al., Electromigration in AlCu lines: comparison of Dual Damascene and metal reactive ion etching, THIN SOL FI, 388(1-2), 2001, pp. 303-314

Authors: Guha, S Cartier, E Gribelyuk, MA Bojarczuk, NA Copel, MC

Citation: S. Guha et al., Atomic beam deposition of lanthanum- and yttrium-based oxide thin films for gate dielectrics, APPL PHYS L, 77(17), 2000, pp. 2710-2712

Authors: Gusev, EP Copel, M Cartier, E Baumvol, IJR Krug, C Gribelyuk, MA

Citation: Ep. Gusev et al., High-resolution depth profiling in ultrathin Al2O3 films on Si, APPL PHYS L, 76(2), 2000, pp. 176-178

Authors: Gribelyuk, MA Wilk, GD

Citation: Ma. Gribelyuk et Gd. Wilk, Growth and microstructure of Si/CaF2/Si(111) heterostructures, THIN SOL FI, 339(1-2), 1999, pp. 51-57

Authors: Gribelyuk, MA Kittl, JA Samavedam, SB

Citation: Ma. Gribelyuk et al., Effect of Mo doping on accelerated growth of C-54TiSi(2): Evidence for template mechanism, J APPL PHYS, 86(5), 1999, pp. 2571-2575